0010-23716 Applied Material Components pmax pyrometer
The AMAT 0010-23716 is a high-precision pyrometer designed for non-contact temperature measurement in advanced thermal processing systems. As part of Applied Materials’ Pmax series, this infrared temperature sensor delivers ±0.3% measurement accuracy across 300°C to 1500°C range, making it indispensable for wafer processing in 300mm semiconductor fabs. The 0010-23716 model integrates dual-wavelength compensation technology to eliminate errors caused by chamber window contamination or plasma interference.
Specifically engineered for chemical vapor deposition (CVD) and rapid thermal processing (RTP) systems, the AMAT 0010-23716 features 5ms response time with 0.1°C resolution. Its modular design allows direct integration into Applied Materials Centura® and Endura® platforms through industry-standard 25-pin D-sub connectors. The built-in self-diagnostic function continuously monitors lens cleanliness, providing predictive maintenance alerts through SECS/GEM protocol.
Technical Specifications
| Parameter Name | Parameter Value |
|---|---|
| Product Model | 0010-23716 |
| Manufacturer | Applied Materials (AMAT) |
| Product Type | Pyrometer (Infrared Temperature Sensor) |
| Spectral Range | 1.6μm ±0.05μm / 2.3μm ±0.1μm |
| Measurement Range | 300°C to 1500°C |
| Accuracy | ±0.3% of reading or ±1°C (whichever is greater) |
| Response Time | 5ms (90% step change) |
| Emissivity Compensation | 0.10 to 1.00 adjustable |
| Output Signal | 4-20mA analog + RS-485 digital |
| Power Supply | 24V DC ±10% (2.5W max) |
| Environmental Rating | NEMA 12 (IP54 equivalent) |
| Calibration Interval | 12 months (NIST traceable) |
| Lens Material | Synthetic sapphire with AR coating |
Key Features and Advantages:
The AMAT 0010-23716 revolutionizes thermal monitoring with its Dynamic Emissivity Tracking (DET) algorithm, automatically compensating for material phase changes during epitaxial growth processes. Its dual optical path design maintains measurement stability even in high-particle environments, reducing wafer scrap rates by up to 37% compared to conventional pyrometers.
Advanced connectivity: Simultaneous analog and digital outputs enable seamless integration with both legacy and advanced process control (APC) systems. The 0010-23716 supports multi-drop RS-485 networks, allowing 32 devices on a single communication line – ideal for multi-zone furnace monitoring.
For critical applications, the sapphire lens with anti-reflective coating maintains >95% transmission efficiency after 10,000 process cycles. The hermetically sealed housing withstands 10^-6 Torr vacuum conditions, making it suitable for atomic layer deposition (ALD) chambers.
Application Areas:
The AMAT 0010-23716 is essential in:
- 3D NAND production: Real-time temperature control for oxide/nitride stack deposition
- FinFET manufacturing: Spike anneal process monitoring with 0.5°C uniformity
- GaN epitaxy: Wafer temperature measurement in MOCVD reactors
- Advanced packaging: Thermal compression bonding process control
In high-k metal gate fabrication, the 0010-23716 enables precise monitoring of millisecond-scale thermal budgets during flash lamp annealing. Its dual-wavelength design effectively penetrates process gases like NF3 and ClF3 during chamber clean operations.
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